Understanding Ultra Low-k Dielectric Films

Dielectric materials are of critical importance in the function of microelectronic devices. This article outlines why and the mechanical characterization of Ultra Low-k Dielectric Films.

Understanding Ultra Low-k Dielectric Films

Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with Ultrathin (<2 nm) Polymer Coating.

High-performance ultra-low-k fluorine-doped nanoporous organosilica films for inter-layer dielectric

Understanding Capacitor Types and Characteristics

Nano-porous dielectrics and copper barriers for 28nm and below

PDF) PECVD low and ultralow dielectric constant materials: From invention and research to products

Breaking The 2nm Barrier

Thin-Film/Low-K Dielectric Constant Measurement

IDTechEx Explores Technology Trends in Dielectric Materials for Next Generation 2.5D and 3D Semiconductor Packaging